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Déposition des couches minces d’alliage Fe-Cu par voie électrochimique

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dc.contributor.author Kettafa khaoula
dc.date.accessioned 2021-07-07T08:45:34Z
dc.date.available 2021-07-07T08:45:34Z
dc.date.issued 2017-07-01
dc.identifier.uri https://dspace.univ-bba.dz:443/xmlui/handle/123456789/832
dc.description.abstract Abstract In this work we are interested in the study of the electrochemical, morphological and structural characteristics of thin films of the Fe-Cu alloy, obtained by electrodeposition on a ruthenium substrate from a sulfate bath. The kinetic study of Fe-Cu deposition and the optimization of the electrodeposition conditions of the Fe-Cu alloys. The analysis of transient currents using the theoretical model of Scharifker-Hills indicates that the alloy's nucleation-growth mechanism does not correspond to the progressive model or the instantaneous model. The characterization of the samples was determined by an atomic force microscopy (AFM) X-ray diffraction (XRD); the morphology of the deposits obtained becomes increasingly fine by diminishing the potential. X-ray diffraction analysis showed that the films crystallize in varieties –of phase: a mixture of Cu fcc and Fe bcc structures. en_US
dc.language.iso fr en_US
dc.publisher Faculté des Sciences et Technologies en_US
dc.relation.ispartofseries ;SM/M/CH/2017/07
dc.subject Films Fe-Cu, Electrodéposition, Nucléation-Croissance, Morphologie, Structure. en_US
dc.title Déposition des couches minces d’alliage Fe-Cu par voie électrochimique en_US
dc.type Thesis en_US


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