Déposition des couches minces d’alliage Fe-Cu par voie électrochimique

dc.contributor.authorKettafa khaoula
dc.date.accessioned2021-07-07T08:45:34Z
dc.date.available2021-07-07T08:45:34Z
dc.date.issued2017-07-01
dc.description.abstractAbstract In this work we are interested in the study of the electrochemical, morphological and structural characteristics of thin films of the Fe-Cu alloy, obtained by electrodeposition on a ruthenium substrate from a sulfate bath. The kinetic study of Fe-Cu deposition and the optimization of the electrodeposition conditions of the Fe-Cu alloys. The analysis of transient currents using the theoretical model of Scharifker-Hills indicates that the alloy's nucleation-growth mechanism does not correspond to the progressive model or the instantaneous model. The characterization of the samples was determined by an atomic force microscopy (AFM) X-ray diffraction (XRD); the morphology of the deposits obtained becomes increasingly fine by diminishing the potential. X-ray diffraction analysis showed that the films crystallize in varieties –of phase: a mixture of Cu fcc and Fe bcc structures.en_US
dc.identifier.urihttp://10.10.1.6:4000/handle/123456789/832
dc.language.isofren_US
dc.publisherFaculté des Sciences et Technologiesen_US
dc.relation.ispartofseries;SM/M/CH/2017/07
dc.subjectFilms Fe-Cu, Electrodéposition, Nucléation-Croissance, Morphologie, Structure.en_US
dc.titleDéposition des couches minces d’alliage Fe-Cu par voie électrochimiqueen_US
dc.typeThesisen_US

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